Artemis

Artemis is the CLF’s facility for ultrafast science, using extreme ultraviolet (XUV) pulses produced through high-harmonic generation for time-resolved photoelectron spectroscopy, photoemission, transient absorption and ptychographic imaging.

Facility Overview

Two high repetition-rate Yb-based laser systems

The specifications are:

    • 0.2 to 2mJ, < 50fs pulses at 1 micron and 1700nm
    • Tuneable pulses from UV to mid-IR
    • 100kHz repetition rates and high stability

Three vacuum beamlines for XUV generation, wavelength selection and focusing.

Four end-stations for experiments

The end stations are:

  • MatSci, for photoemission from solid samples
  • DynAMO, for gas-phase photoelectron and photo-ion spectroscopy
  • XTAS, for XUV transient absorption up to 150eV
  • Ptychography, for XUV coherent lensless imaging

Experiments on Artemis use high harmonic generation (HHG) to investigate ultrafast dynamics in experiments on gas, liquidand solid materials. The spatial coherence of the XUV radiation is also leveraged to perform coherent diffractive imaging techniques. Artemis is based on high-repetition rate, widely tuneable femtosecond laser sources, and ultrafast XUV (10 to 150eV) pulses produced through HHG. The facility comprises two ultrafast laser systems and three in-vacuum XUV beamlines, with four specialised end-stations to support user experiments.

Applications

In the atmosphere, sunlight triggers photochemical reactions that can breakdown chemicals to form new products or free radicals. Recent experiments on Artemis have studied several molecules that are atmospheric pollutants, using ultraviolet pulses to initiate the photochemical reaction and then XUV to study its evolution in time and final photoproducts.

Technical specifications

Artemis has two high-repetition rate and high average power femtosecond laser systems, three vacuum beamlines for XUV generation and filtering, and four end-stations for user experiments.

Laser system 1: Fastlite OPCPA 

System 1 is a 100kHz infrared laser system from Fastlite, producing >20W (200µJ) in 50fs pulses at 1700nm, and >5W in 60fs pulses at 3000nm. The system is based on Optical Parametric Chirped Pulse Amplification (OPCPA), pumped by a 225-W Yb:YAG thin-disk regenerative amplifier from Trumpf Scientific, based on an industrial micro-machining system. The OPCPA has two modes of output. One offers <50fs pulses at 1700nm and <60fs pulses at 3000nm, and the other offers broader tuning ranges (1,430 to 1,850nm and 2,330 to 3,680nm) but slightly longer pulses (80 to 180fs).  

The system also has a multi-pass Herriott cell to generate short pulses at 1030nm to be used for high-harmonic generation (HHG). Alternatively, the 1700 nm infrared can be split and a portion used for HHG whilst the rest is used for the optical pump. 

Laser system 2: Light Conversion system 

System 2 is a 100kHz laser system from Light Conversion. It consists of three optically synchronised Yb:KGW lasers (Light Conversion Carbides) using a common oscillator. One 200W Carbide laser is used to drive a hollow core fibre (FewCycle) to generate >150W of <50fs, 1030nm light which is used for high-harmonic generation. A second 200W Carbide is used to drive one of two Orpheus optical parametric amplifiers to produce short pulses which are continuously tuneable from 235nm to 10 microns. A third 80W Carbide laser will be post-compressed or used for frequency mixing. 

High harmonic light sources 

Artemis produces coherent, femtosecond pulses of extreme ultraviolet (XUV) through high harmonic generation (HHG) in a gas target. A laser is focused to an intensity of approximately 1014 Wcm-2 in a differentially pumped gas cell and up to one part in 106 of the energy is converted to short pulses of XUV radiation in the 8 to 120nm (10 to 150eV) range. The XUV pulses have a similar pulse-duration to the drive laser pulses (approximately 50fs) and are synchronised to them with sub-fs resolution.

Meet the team

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